| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in both sensitivity and stability, and excellent also in balance of various properties such as tent strength, resolution and non-contaminating property of a plating solution, and to provide a photosensitive dry film. <P>SOLUTION: The photosensitive resin comprises contains at least an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), wherein the photopolymerization initiator (C) contains at least a hexaarylbisimidazole compound (C1) and a polyfunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed of the photosensitive resin composition on a support film. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
