发明名称 |
LASER IRRADIATION APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
A deflecting mirror which deflects a laser beam emitted from a laser oscillator, a transfer lens, a cylindrical lens array which divides the laser beam having passed through the transfer lens into a plurality of laser beams, and a condensing lens which superposes the laser beams formed in the cylindrical lens array are included. The following formula is satisfied: 1/f = 1/(a + b) + 1/c, when: "a" is a distance between an emission opening of the laser oscillator and the deflecting mirror; "b" is a distance between the deflecting mirror and the transfer lens; "c" is a distance between the transfer lens and an incidence plane of the cylindrical lens array; and "f" is a focal length of the transfer lens. |
申请公布号 |
WO2007049525(A1) |
申请公布日期 |
2007.05.03 |
申请号 |
WO2006JP320986 |
申请日期 |
2006.10.16 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;TANAKA, KOICHIRO;OISHI, HIROTADA |
发明人 |
TANAKA, KOICHIRO;OISHI, HIROTADA |
分类号 |
H01L21/268;H01L21/20;H01L21/336;H01L21/8234;H01L21/8238;H01L27/06;H01L27/08;H01L27/092;H01L29/786 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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