发明名称 System and method for fault indication on a substrate in maskless applications
摘要 A method and system for fault indication on a substrate. A method of the present invention includes the following steps. It is determined whether data includes at least one suspicious bit. A pattern generator is controlled with the data. A beam of radiation is patterned using the pattern generator. Features are projected by the patterned beam of radiation onto a target portion of a substrate. One or more markers are projected by the patterned beam of radiation onto the substrate indicating the target portions that correspond with the at least one suspicious bit.
申请公布号 US7403865(B2) 申请公布日期 2008.07.22
申请号 US20040022926 申请日期 2004.12.28
申请人 ASML NETHERLANDS B.V. 发明人 HOEKS MARTINUS
分类号 G01R31/00;G01B5/30;G01F19/00 主分类号 G01R31/00
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