发明名称 |
System and method for fault indication on a substrate in maskless applications |
摘要 |
A method and system for fault indication on a substrate. A method of the present invention includes the following steps. It is determined whether data includes at least one suspicious bit. A pattern generator is controlled with the data. A beam of radiation is patterned using the pattern generator. Features are projected by the patterned beam of radiation onto a target portion of a substrate. One or more markers are projected by the patterned beam of radiation onto the substrate indicating the target portions that correspond with the at least one suspicious bit.
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申请公布号 |
US7403865(B2) |
申请公布日期 |
2008.07.22 |
申请号 |
US20040022926 |
申请日期 |
2004.12.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOEKS MARTINUS |
分类号 |
G01R31/00;G01B5/30;G01F19/00 |
主分类号 |
G01R31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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