| 摘要 |
<p>Disclosed are a compound usable for a resist composition, a positive resist composition containing such a compound, and a method for forming a resist pattern. Specifically disclosed is a compound represented by the formula (A-1) below. In the formula (A-1) below, R11-R17 respectively represent an alkyl group or an aromatic hydrocarbon group; g and j respectively represent an integer of not less than 1, k and q respectively represent an integer of not less than 0, and g + j + k + q is not more than 5; b represents an integer of not less than 1, l and m respectively represent an integer of not less than 0, and b + l + m is not more than 4; c represents an integer of not less than 1, n and o respectively represent an integer of not less than 0, and c + n + o is not more than 4; A represents a trivalent aromatic cyclic group, an alkyl group, an alicyclic group, or a trivalent organic group having an aromatic cyclic group or alicyclic group; and Z represents a group represented by the formula (z1) below. In the formula (z1) below, Y represents an alkylene group, a divalent aromatic hydrocarbon group, an alicyclic group, or a divalent organic group having an aromatic hydrocarbon group or alicyclic group; and R' represents an acid-cleavable dissolution inhibiting group. ® KIPO & WIPO 2009</p> |
