发明名称 RESISTANCE CHANGEABLE MEMORY DEVICE AND FORMING THEREOF
摘要 <p>A variable resistance memory device and a forming method thereof is provided to suppress the resistance drift phenomenon of a chalcogen amorphous material by deforming the chalcogen amorphous material. A variable resistance memory device comprises a resistance alteration material in which fluctuation index according to the time of a resistance at a programmed data state is 0.18 or less. The resistance alteration material is a phase change material. The programmed data state is the amorphous state of the phase change material. The carbon or the nitrogen atom is doped in the phase change material. The variable resistance memory device is a multi-level memory device including memory cells having one among a plurality of data states.</p>
申请公布号 KR20080111956(A) 申请公布日期 2008.12.24
申请号 KR20070060562 申请日期 2007.06.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JEONG, CHANG WOOK;KANG, DAE HWAN;KIM, HYEONG JUN;KO, SEUNG PIL;LIM, DONG WON
分类号 H01L27/115 主分类号 H01L27/115
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