| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for a stain resistance imparting agent having excellent hardness and scratch resistance, and to provide a cured product and an article using the composition. SOLUTION: The composition contains the following polymer (A) and a radically polymerizable photoinitiator (B). The polymer (A) has a structure produced by allowing a carboxylic acid having 1 to 5 (meth)acryloyl groups in one molecule to react with at least a part of epoxy groups in a radically polymerized product of a monomer mixture that contains: (a1) 1 to 20 pts.wt. ofα,ω-dimercapto polysiloxane; (a2) 15 to 60 pts.wt. of (meth)acrylate having an epoxy group; (a3) 0.5 to 5 pts.wt. of monofunctional mercaptan having a molecular weight of 100 to 300; and (a4) 15 to 83.5 pts.wt. of other radically polymerizable monomers, in total 100 pts.wt., with a ratio of mercapto groups of (a1)/mercapto groups of (a3) ranging from 0.2 to 20 (mol/mol). COPYRIGHT: (C)2009,JPO&INPIT |
