PLASMA PROCESSING APPARATUS

摘要

The present invention relates to a device for applying process control such as APC or the like. Provided is a plasma processing device having process control technology obtaining a stable processing result. The present invention relates to the plasma processing device capable of processing plasma to a lot which is assembly of a single or plural sample by controlling change of plasma processing with feedback control or feedforward control. A plasma processing controlling device purifies a recovery condition in a processing room of a first lot recovering a state in a processing room in which plasma processing is performed by using standby time from the plasma processing of a second lot in which plasma processing is performed to plasma processing open of the first lot before the first lot in which the plasma processing is performed, and plasma processing contents of the second lot.