发明名称 TECHNIQUE FOR PHOTODISRUPTIVE MULTI-PULSE TREATMENT OF A MATERIAL
摘要 Embodiments of the invention provide a method and apparatus for laser-processing a material. In the embodiments, a diffraction-limited beam of pulsed laser radiation is diffracted by a diffraction device to generate a diffracted beam. The diffracted beam is subsequently focused onto the material and is controlled in time and space to irradiate the material at a target position with radiation from a set of radiation pulses of the diffracted beam so that each radiation pulse from the set of radiation pulses is incident at the target position with a cross-sectional portion of the diffracted beam, the cross-sectional portion including a local intensity maximum of the diffracted beam. The beam cross-sectional portions of at least a subset of the pulses of the set include each a different local intensity maximum. In this way, a multi-pulse application for generating a photo-disruption at a target location of the material can be implemented.
申请公布号 US2016166431(A1) 申请公布日期 2016.06.16
申请号 US201414785826 申请日期 2014.05.07
申请人 Wavelight GMBH 发明人 Vogler Klaus;Donitzky Christof
分类号 A61F9/008;H01S3/00 主分类号 A61F9/008
代理机构 代理人
主权项 1. A method of laser-processing a biological or non-biological material, the method comprising: providing a diffracted beam of pulsed laser radiation; irradiating the material at a target position with radiation from a set of radiation pulses of the diffracted beam to generate a photo-disruption at the target position, wherein each radiation pulse from the set of radiation pulses is incident at the target position with a cross-sectional portion of the diffracted beam, the cross-sectional portion including a local intensity maximum of the diffracted beam, wherein the beam cross-sectional portions of at least a subset of the pulses of the set include each a different local intensity maximum.
地址 Erlangen DE