| 发明名称 |
PLANT CULTIVATION APPARATUS |
| 摘要 |
A plant cultivation apparatus of the present disclosure includes a first light source unit configured to include a first laser diode radiating a first light beam, and a first scanning mechanism scanning the first light beam and forming a first radiation region, a second light source unit configured to include a second laser diode radiating a second light beam, and a second scanning mechanism scanning the second light beam and forming a second radiation region, and a signal processor configured to control the first light source unit and the second light source unit. A wavelength of the first light beam is the same as a wavelength of the second light beam. The signal processor forms a multiple radiation region by causing the first radiation region and the second radiation region to overlap each other. |
| 申请公布号 |
US2016192599(A1) |
申请公布日期 |
2016.07.07 |
| 申请号 |
US201615072841 |
申请日期 |
2016.03.17 |
| 申请人 |
Panasonic Intellectual Property Management Co., Ltd. |
发明人 |
YAJIMA Masatoshi;HASHIMOTO Akifumi;KAWANO Kenji;YAMAZAKI Masahiro |
| 分类号 |
A01G7/04;F21V23/00 |
主分类号 |
A01G7/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plant cultivation apparatus comprising:
a first light source unit configured to include a first laser diode radiating a first light beam, and a first scanning mechanism scanning the first light beam and forming a first radiation region; a second light source unit configured to include a second laser diode radiating a second light beam, and a second scanning mechanism scanning the second light beam and forming a second radiation region; and a signal processor configured to control the first light source unit and the second light source unit, wherein a wavelength of the first light beam is the same as a wavelength of the second light beam, and the signal processor forms a multiple radiation region by causing the first radiation region and the second radiation region to overlap each other. |
| 地址 |
Osaka JP |
