| 发明名称 | Target material supply apparatus for an extreme ultraviolet light source | ||
| 摘要 | A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface. | ||
| 申请公布号 | US9392678(B2) | 申请公布日期 | 2016.07.12 |
| 申请号 | US201213652755 | 申请日期 | 2012.10.16 |
| 申请人 | ASML Netherlands B.V. | 发明人 | De Dea Silvia;Vaschenko Georgiy O.;Baumgart Peter;Bowering Norbert |
| 分类号 | H05G2/00;C23C14/18 | 主分类号 | H05G2/00 |
| 代理机构 | DiBerardino McGovern IP Group LLC | 代理人 | DiBerardino McGovern IP Group LLC |
| 主权项 | 1. A target material supply apparatus for an extreme ultraviolet (EUV) light source, the apparatus comprising: a tube comprising a first end, a second end, and a sidewall defined between the first and second ends, wherein at least a portion of an outer surface of the tube comprises an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets; and an electrically conductive coating on the second end of the tube that defines the orifice, the coating being configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface. | ||
| 地址 | Veldhoven NL | ||