| 摘要 |
PURPOSE:To produce a silicon laminate capable of improving the crystallinity of a polycrystal silicon film by plasma spraying. CONSTITUTION:The particles of silicon are introduced into high-temp. plasma and melted, a film of the melt is formed on heated carbon-fiber woven fabric 21, and the melt film is ultrasonically vibrated to form a polycrystal silicon film. Any region in the polycrystal silicon film where the crystal grain diameter is small or the region where the silicon atom linkage is broken or the intercrystal distance is irregulare is more easily broken by the ultrasonic vibration energy than the normal region, the broken region is recrystallized by the surrounding heat energy, and the crystallinity is improved. |
