| 摘要 |
PURPOSE:To reduce the working time by moving an optical system and a body irradiated with the laser beam to make a relative movement of the body to be irradiated along the direction orthogonal to the optical axis of the laser beam flux. CONSTITUTION:An XY stage 22 to move an optical system assembly in X- direction and Y-direction, and a wafer stage 32 to move a wafer 31 in X- direction and Y-direction ate provided. The relative position of the wafer 31 along the direction orthogonal to the optical axis is changed by the XY stage 22 and the wafer stage 32, and the prescribed exposure lithographic pattern is formed on the surface of the wafer 31. When the relative position of the wafer 31 is changed along the direction orthogonal to the optical axis, both the optical system assembly and the wafer 31 are moved, and the quantity of movement becomes halt as that in the case where only the wafer 31 is moved, and the moving operation is quickened. |
