发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES HAVING HIGH PLANAR JUNCTION BREAKDOWN VOLTAGE
摘要 A body of semiconductor material having first and second opposed faces, and containing a region of N type conductivity and a region of P type conductivity separated by a P-N junction. The N type region contains a central portion extending inward from one face partially through the body toward the second face, and a peripheral portion extending completely through the body with its resistivity increasing toward the second face relative to the remainder of the N type region adjacent the P-N junction. The peripheral portion encloses the P type region and extends the P-N junction to the second face where it has the least chance for voltage breakdown.
申请公布号 US3664894(A) 申请公布日期 1972.05.23
申请号 USD3664894 申请日期 1970.02.24
申请人 RCA CORP. 发明人 WILLEM GERARD EINTHOVEN;HOWARD KENNETH DONNELL
分类号 H01L29/73;H01L21/225;H01L21/331;H01L21/78;H01L29/00;(IPC1-7):H01L7/44 主分类号 H01L29/73
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