发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES HAVING HIGH PLANAR JUNCTION BREAKDOWN VOLTAGE |
摘要 |
A body of semiconductor material having first and second opposed faces, and containing a region of N type conductivity and a region of P type conductivity separated by a P-N junction. The N type region contains a central portion extending inward from one face partially through the body toward the second face, and a peripheral portion extending completely through the body with its resistivity increasing toward the second face relative to the remainder of the N type region adjacent the P-N junction. The peripheral portion encloses the P type region and extends the P-N junction to the second face where it has the least chance for voltage breakdown.
|
申请公布号 |
US3664894(A) |
申请公布日期 |
1972.05.23 |
申请号 |
USD3664894 |
申请日期 |
1970.02.24 |
申请人 |
RCA CORP. |
发明人 |
WILLEM GERARD EINTHOVEN;HOWARD KENNETH DONNELL |
分类号 |
H01L29/73;H01L21/225;H01L21/331;H01L21/78;H01L29/00;(IPC1-7):H01L7/44 |
主分类号 |
H01L29/73 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|