| 摘要 |
PURPOSE:To make it possible to execute direct exposure of wafer at a high speed in such a manner as to make compensation of pattern data only by obtaining a new marking position, by compensating an electronic beam scanning position with a memorized marking position and a detected marking position. CONSTITUTION:A stage 7 is shifted by a servomotor on the basis of a command from an electronic calculator 18. Position of the stage 7 is detected by a laser interference meter 9, this detected signal is given to a pattern compensation circuit 13 to compensate pattern data from a pattern generating circuit 14 and then to deflect an electronic beam from an electronic beam generating unit 2 in accordance with the data converted to an analog signal. |
