发明名称 LIGHT-SOURCE CLEANING APPARATUS FOR PHOTOELECTRIC DETECTOR
摘要 PURPOSE:To maintain high detecting performance by providing a cleaning member at a contact response position corresponding to a movable locus in front of the light source of a photoelectric detector, and always cleaning the light source. CONSTITUTION:A light-source cleaning apparatus 13 is composed of a movable mechanism 19 which moves a light projector 17 to the slant state from an upward facing position and a cleaning member 20 which is arranged on a movable locus in front of the light source of the light projector 17. The mechanism 19 is composed of a light-projector supporting piece 21, an eccentric roller 22 and an energizing spring 23. The light projector 17 is energized and supported at one side with a supporting pin 24 as a rotation supporting point. In the light-source cleaning apparatus of the photoelectric detector constituted in this way, the eccentric roller 22 is driven and a driving shaft 25 is rotated by one rotation when medium conveying is finished and detection is not performed. Thus, the eccentric roller 22 is rotated in the eccentric pattern and largely inclined. The front surface of the light projector 17 comes into contact with the cleaning member 20, and the surface is polished. Thus the surface of the projector 17 is automatically cleaned, and the highly reliable photoelectric detection performance is maintained.
申请公布号 JPH0427831(A) 申请公布日期 1992.01.30
申请号 JP19900133512 申请日期 1990.05.22
申请人 OMRON CORP 发明人 FUJIWARA ATSUSHI
分类号 G01V8/12;B08B1/00;G01J1/04;G07D5/00;G07D7/00;G07D7/12 主分类号 G01V8/12
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