发明名称 Transfer apparatus
摘要 A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.
申请公布号 US5253663(A) 申请公布日期 1993.10.19
申请号 US19920935400 申请日期 1992.08.26
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON SAGA LIMITED 发明人 TANAKA, HIROSHI;NISHI, MITSUO;MIZOGUCHI, RYUICHI;KAMIKAWA, YUUJI
分类号 H01L21/00;H01L21/677;(IPC1-7):B08B3/02 主分类号 H01L21/00
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