发明名称 |
ELECTRONIC DEVICE SUBSTRATE, MANUFACTURING METHOD THEREOF, AND THIN-FILM PIEZOELECTRIC ELEMENT USING IT |
摘要 |
PROBLEM TO BE SOLVED: To provide an electronic device wherein the tensile stress applied on a ferroelectric thin film from a semiconductor device is relaxed by a simple method. SOLUTION: An electronic device substrate is provided which comprises a lower part electrode 5 of an epitaxial film formed on a semiconductor substrate 3, a ferroelectric layer 6 of an epitaxial film formed on the lower part electrode 5, and an upper part electrode 7 formed on the ferroelectrics layer 6. The film-thickness of the lower part electrode 5 is set to 200-1000 nm. Thus, the tensile stress applied on the ferroelectrics thin-film 6 from the semiconductor substrate 3 is relaxed, raising the ratio of c-domain of the ferroelectrics thin-film 6. |
申请公布号 |
JP2002164586(A) |
申请公布日期 |
2002.06.07 |
申请号 |
JP20000357742 |
申请日期 |
2000.11.24 |
申请人 |
TDK CORP |
发明人 |
NOGUCHI TAKAO;SAITO HISATOSHI;YANO YOSHIHIKO;ABE SHUSUKE |
分类号 |
H01L41/08;H01L41/18;H01L41/22;H01L41/29;H01L41/316;H01L41/319 |
主分类号 |
H01L41/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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