发明名称 THIN FILM DEVICE, ITS MANUFACTURING METHOD, AND THIN FILM INDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a thin film device capable of securing operation performance by sufficiently insulating a conductive film pattern from the circumference. SOLUTION: A recess 11S is provided in an insulating substrate 11 outside a region where the insulating substrate 11 and the conductive film pattern 12 make contact with each other, and adjoining to that region. In a manufacturing process of the thin film device 10, a resin insulating film 14 is likely to be filled so as to coat the conductive film pattern 12 covered with a covering insulating film 13 so that the conductive film pattern 12 is sufficiently insulated from the circumference. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007103510(A) 申请公布日期 2007.04.19
申请号 JP20050289131 申请日期 2005.09.30
申请人 TDK CORP 发明人 TAKASUGI KEISUKE
分类号 H01F17/00;H01F41/04 主分类号 H01F17/00
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