发明名称 |
Top coat composition |
摘要 |
The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
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申请公布号 |
US7402626(B2) |
申请公布日期 |
2008.07.22 |
申请号 |
US20040980769 |
申请日期 |
2004.11.04 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MAEDA KAZUHIKO;KOMORIYA HARUHIKO;SUMIDA SHINICHI;MIYAZAWA SATORU;OOTANI MICHITAKA |
分类号 |
C08K3/00;G03F7/11;C09J133/14;H01L21/027 |
主分类号 |
C08K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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