发明名称 |
TRANSFER MASK BLANK, TRANSFER MASK, AND TRANSFER METHOD USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To attain an efficient production of a transfer mask for charged corpuscular rays including electron beams, a transfer mask for X-rays and a transfer mask for extreme ultraviolet rays by means of an existing device such as an electron beam drawing device for photomasks with improved accuracy in processing mask patterns. <P>SOLUTION: The transfer mask and a transfer mask blank therefor are arranged such that a substrate 2 is profiled to have a substantially rectangular parallelepiped shape; an opening 3 is provided at approximately a center portion of a lower surface of the substrate 2; a self-supporting thin film m is supported at approximately a center portion of an upper surface of the substrate 2 corresponding to the opening 3 to provide a pattern region 4, a through-holes h, or absorbers or scatterers for the mask patterns are provided at the self-supporting thin film m; and the pattern region 4 and a region 5 around the pattern region 4 are in the same plane. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004186369(A) |
申请公布日期 |
2004.07.02 |
申请号 |
JP20020350837 |
申请日期 |
2002.12.03 |
申请人 |
DAINIPPON PRINTING CO LTD;RIIPURU:KK |
发明人 |
SANO NAOTAKE;HOGEN MORIHISA;IIMURA YUKIO;ARITSUKA YUKI;KURIHARA MASAAKI;NOZUE HIROSHI;YOSHIDA AKIRA |
分类号 |
G03F1/20;G03F1/22;G03F1/24;G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03F1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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