SUBSTRATE WASHING METHOD AND FUNCTIONAL SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a substrate washing method capable of extremely reducing the residue of a washing agent without exerting adverse effect on a substrate, and a functional substrate scarcely having contamination ions bringing about trouble in the development of the function of a functional member. SOLUTION: In the substrate washing method, a pure water washing condition after washing using the washing agent is set so that the relation of B<=1.0×10<-3> A is established from an anion intensity A of a specific component of the washing agent remaining on the substrate after washing using the washing agent and an anion intensity B of the specific component remaining on the substrate after pure water washing is applied to the substrate. The functional substrate is obtained by forming the functional member on the substrate and applying washing treatment to this substrate by the substrate washing method.