| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition method in which a homogeneous thin film layer for an element is deposited even on a substrate for a large screen. SOLUTION: In this method for depositing a thin film layer for an element, two or more materials are vacuum evaporated to deposit one or more thin films on the surface of the substrate. The evaporation is performed as follows: the ni value of each evaporation material (i) lies in the range of k±0.5 wherein, k is the constant of 2 to 5}: in the relation between the deposite position on the surface of the substrate and the thickness of the deposited film is approximated by the following formula (1) all Di/D0i∝(L0/Li)3 cosniθi... (1) wherein, L0 is a vertical distance from the evaporation source to the face of the substrate, D0i is the thickness of the film at the intersection of a perpendicular from the source to the face of the substrate and the face of the substrate, Di is the thickness of the film at the position in which the radiation angle from the perpendicular isθi, and the distance from the source is Li}.</p> |
