发明名称 |
Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes and related methods |
摘要 |
A microelectronic device includes an insulating layer on a microelectronic substrate wherein the insulating layer has a contact hole therein exposing a portion of the microelectronic substrate. A first capacitor electrode is provided on a surface of the insulating layer opposite the microelectronic substrate and adjacent the contact hole wherein a lower portion of the first capacitor electrode extends into the contact hole below the surface of the insulating layer. A ferroelectric layer is provided on the first capacitor electrode, and a second capacitor electrode is provided on the ferroelectric layer. Related methods and memory devices are also discussed.
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申请公布号 |
US2001000624(A1) |
申请公布日期 |
2001.05.03 |
申请号 |
US20000747466 |
申请日期 |
2000.12.22 |
申请人 |
HWANG CHEOL-SEONG;LEE BYOUNG-TAEK |
发明人 |
HWANG CHEOL-SEONG;LEE BYOUNG-TAEK |
分类号 |
H01L29/92;H01L21/02;H01L21/768;(IPC1-7):H01L21/824 |
主分类号 |
H01L29/92 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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