发明名称 Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes and related methods
摘要 A microelectronic device includes an insulating layer on a microelectronic substrate wherein the insulating layer has a contact hole therein exposing a portion of the microelectronic substrate. A first capacitor electrode is provided on a surface of the insulating layer opposite the microelectronic substrate and adjacent the contact hole wherein a lower portion of the first capacitor electrode extends into the contact hole below the surface of the insulating layer. A ferroelectric layer is provided on the first capacitor electrode, and a second capacitor electrode is provided on the ferroelectric layer. Related methods and memory devices are also discussed.
申请公布号 US2001000624(A1) 申请公布日期 2001.05.03
申请号 US20000747466 申请日期 2000.12.22
申请人 HWANG CHEOL-SEONG;LEE BYOUNG-TAEK 发明人 HWANG CHEOL-SEONG;LEE BYOUNG-TAEK
分类号 H01L29/92;H01L21/02;H01L21/768;(IPC1-7):H01L21/824 主分类号 H01L29/92
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