发明名称 LIQUID OPAQUE MATERIAL AND METHOD FOR CORRECTING MASK FILM USING LIQUID OPAQUE MATERIAL
摘要 PURPOSE:To provide liquid opaque material which can be applied uniformly and has excellent drying property, and a method for correcting image forming mask material using the liquid opaque material. CONSTITUTION:A heat melt transfer medium A having at least a light impermeable layer 3 is superposed on an image receiving body 6. After the heat melt transfer medium A is heated from its rear face for printing, the heat melt transfer medium A is separated for making image forming mask material. When pinholes or flaws are generated on this image forming mask material, the parts having defects are coated with liquid opaque material by a brush so as to correct them. The liquid opaque material. has a surface tension of 35dyne/cm or less and viscosity at the room temperature is 10-100 centipoise.
申请公布号 JPH04294193(A) 申请公布日期 1992.10.19
申请号 JP19910084737 申请日期 1991.03.25
申请人 KONICA CORP 发明人 OGAWA TAKAHIRO;ABE TAKAO;KAWAKAMI SOTA;SUGAIWA TAKAYUKI;KAWAMURA TOMONORI
分类号 B41M5/392;B41M5/30;G03C5/08 主分类号 B41M5/392
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