发明名称 SUBSTRATE SUPPORT FOR A THERMAL PROCESSING CHAMBER
摘要 <p>A substrate support, such as an edge ring (134), includes an inner portion (150), and an outer portion (152) contiguous with the inner portion (150) and extending radially outward therefrom. The inner portion (150) has a raised annular extension (164) forming a ridge for supporting a substrate.</p>
申请公布号 WO1999050606(A1) 申请公布日期 1999.10.07
申请号 US1999003928 申请日期 1999.02.23
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