发明名称 SUBSTANCES FOR SUPPRESSING FORMATION OF DEPOSITS
摘要 <p>The invention relates to build-up agents which comprise a condensation product among an aldehyde, a phenol compound and an aromatic carboxylic acid, hydroxy-substituted on the aromatic nucleus. The products are particularly effective in reducing or suppressing the build-up formation in the polymerization of vinyl chloride or vinyl acetate, other copolymerizable substances being optionally present. Further objects of the invention are compositions containing the above agents, their use as build-up agents, methods for their preparation and the products obtained therefrom, the polymerization processes carried out in reactors whose inner walls are coated with these agents and polymers obtained from these process.</p>
申请公布号 CZ9901980(A3) 申请公布日期 1999.11.17
申请号 CZ19990001980 申请日期 1997.07.29
申请人 3V SIGMA S. P. A. 发明人 RASPANTI GUISEPPE;ZANOTTI RUSSO MATTEO
分类号 B01J3/00;B01J19/26;C08F2/00;C08F2/44;C08F14/06;C08F18/08;C08G8/32;C08G16/02;C08L61/14;C23C22/00;(IPC1-7):C08F14/06;C08G14/067 主分类号 B01J3/00
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