| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure mask capable of faithfully transferring a pattern using a constant amount of light, while improving the resolution limit of a transfer apparatus. SOLUTION: A mask pattern with a standardized dimension from 0.34 to 0.68, formed by a semitransparent phase shifter is disposed on a mask pattern made of shield material so as to be protruded from the edge of the mask pattern made of shield material.</p> |
