Substrate positioning control apparatus in cleaning processing system for glass wafer used in liquid crystal display

摘要

The stepper motor (50) rotates the wafer (W) and the power produced is transmitted to rotation transmittance rollers (41,42) by the action of transmittance switching unit (60). The operation of stepper motor and transmittance switching unit is controlled by CPU (80), based on the signal received from photo sensor (70). The power produced by rotation of stepper motor (50) is transmitted to transmittance rollers (41,42) which are arranged on the circumference of the wafer. The wafer rotates by the action of transmittance switching unit (60). An Independent claim is also included for substrate position control method.