| 摘要 |
A pMOS transistor having reduced diffusion from source/drain regions and a method of forming the same are provided. The pMOS transistor includes a source/drain region doped with a p-type impurity and a diffusion-retarding material in a semiconductor substrate. The pMOS transistor further includes a gate dielectric over a channel region in the semiconductor substrate, a gate electrode over the gate dielectric, and a lightly doped source/drain (LDD) region substantially aligned with an edge of the gate electrode. The diffusion-retarding material preferably includes carbon, fluorine, nitrogen, and combinations thereof.
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