发明名称 Magnetic memory and method of manufacturing the same
摘要 According to one embodiment, a magnetic memory is disclosed. The memory includes a conductive layer containing a first metal material, a stacked body above the conductive layer, and including a first magnetization film containing a second metal material, a second magnetization film, and a tunnel barrier layer between the first magnetization film and the second magnetization film, and an insulating layer on a side face of the stacked body, and containing an oxide of the first metal material. The first magnetization film and/or the second magnetization film includes a first region positioned in a central portion, and a second region positioned in an edge portion and containing As, P, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, Si, B, C, O, Zr, Tb, S, Se, or Ti.
申请公布号 US9385304(B2) 申请公布日期 2016.07.05
申请号 US201414203249 申请日期 2014.03.10
申请人 KABUSHIKI KAISHA TOSHIBA;SK HYNIX INC. 发明人 Nakayama Masahiko;Kai Tadashi;Toko Masaru;Yoda Hiroaki;Lee Hyung Suk;Oh Jae Geun;Ryu Choon Kun;Lee Min Suk
分类号 H01L27/00;H01L43/02;H01L43/12;H01L45/00;G11C11/56;G11C11/15;G11C11/16;H01L27/22;H01L27/24;H01L43/08;H01L43/10 主分类号 H01L27/00
代理机构 Holtz, Holtz & Volek PC 代理人 Holtz, Holtz & Volek PC
主权项 1. A magnetic memory comprising: a conductive layer containing a first metal material; a stacked body formed above the conductive layer, and comprising a first magnetization film containing a second metal material, a second magnetization film, and a tunnel barrier layer formed between the first magnetization film and the second magnetization film; and an insulating layer formed on a side face of the stacked body, and containing an oxide of the first metal material, wherein the first magnetization film and/or the second magnetization film includes a first region positioned in a central portion and a second region positioned in an edge portion, the second region containing As, P, Ge, Ga, Sb, In, Ar, He, F, CI, Br, I, Si, B, C, Zr, Tb, S, Se, or Ti.
地址 Tokyo JP