发明名称 INSPECTION UNIT, INSPECTION METHOD, AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
摘要 Disclosed are an inspection unit, an inspection method, and a substrate treating apparatus including the same. A substrate treating apparatus includes a treatment unit including a container, and a support member situated in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit. The inspection unit includes a plate of a transparent material, a photographing member situated below the plate, a light source member that irradiates light onto a path of the treatment liquid discharged from the treatment liquid nozzle towards the plate at the inspection position, and a determination member that determines whether the treatment liquid is normally discharged, from an image photographed by the photographing member.
申请公布号 US2016221021(A1) 申请公布日期 2016.08.04
申请号 US201615010242 申请日期 2016.01.29
申请人 Semes Co., Ltd. 发明人 Yang Keunhwa;Ju Yoon Jong;Choi Kihoon;Kim Kwangsup
分类号 B05C5/02;H04N7/18;H04N5/225;B05B1/14 主分类号 B05C5/02
代理机构 代理人
主权项 1. A substrate treating apparatus, comprising: a treatment unit comprising a container, and a support member situated in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate; a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit; and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle, wherein the nozzle unit further comprises a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit, and wherein the inspection unit comprises: a plate of a transparent material; a photographing member situated below the plate; a light source member that irradiates light onto a path of the treatment liquid discharged from the treatment liquid nozzle towards the plate at the inspection position; and a determination member that determines whether the treatment liquid is normally discharged, from an image photographed by the photographing member.
地址 Cheonan-si KR