| 摘要 |
PURPOSE:To contrive improvement in the yield rate in a wafer circulating process by a method wherein a wiper, with which the chemical solution adhering to the inside surface of the chamber of a spinner device will be wiped out, is provided and the inside of the chamber is kept clean. CONSTITUTION:A wiper 4, which rotates contacting to the inner wall part 2 and the bottom face part 3 of a chamber 1, is provided inside the chamber 1. By rotating the wiper by a motor 10 after a photoresist has been dried up by shaking it, the scattered photoresist adhered to the inner wall and the bottom face part of the chamber can be almost wipered out and removed and led to a liquid outlet 12, and a manual cleaning work is unnecessitated. |
