| 发明名称 |
SULFURIC ACID COMPOSITION HAVING LOW SURFACE TENSION. |
| 摘要 |
<p>A surfactant of the general formula: R<1>SO2NR<2>C2H4OA (wherein R<1> represents a fluoroalkyl group, R<2> represents H or a lower alkyl group, and A represents H or SO3H) is added to a cleaning liquid comprising sulfuric acid or sulfuric acid-hydrogen peroxide, used in the semiconductor industry or the like, to lower the surface tension, thus improving the wettability and enhancing the cleaning effect.</p> |
| 申请公布号 |
EP0416126(A1) |
申请公布日期 |
1991.03.13 |
| 申请号 |
EP19900904682 |
申请日期 |
1990.03.15 |
| 申请人 |
NISSAN CHEMICAL INDUSTRIES LTD.;KANTO KAGAKU KABUSHIKI KAISHA |
发明人 |
MORI, K KANTO KAGAKU KK CHUOKENKYUSHO-NAI;SHIHOYA, T;HARA, HISAO |
| 分类号 |
C09K13/08;C09D9/00;C11D1/00;C23F1/16;C23G1/02;H01L21/304;H01L21/306 |
主分类号 |
C09K13/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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