PRODUCTION OF PHOTORESIST PATTERN HAVING T-SHAPE CROSS-SECTION

摘要

PROBLEM TO BE SOLVED: To form a resist pattern having a T-shape cross-section by using a photosensitive material having a photoresist layer on a substrate. SOLUTION: A photoresist layer formed on a substrate is masked with a transparent sheet having an image, and subjected to incomplete exposure with the light quantity corresponding to 15 to 60% of the light quantity necessary to substantially make the bottom part of the photoresist layer insoluble. Then the photoresist layer is developed for the developing time corresponding to about 40 to 85% of the developing time necessary to completely dissolve and remove the bottom part of the exposed photoresist layer in conduct with the substrate.