| 摘要 |
PROBLEM TO BE SOLVED: To enable an original picture pattern to be scanned rapidly with high precision while enabling said pattern to be scan-exposed in high resolving power on a wafer surface by providing a scanning member in the optical path of a scanning projection system and specifying the optical characteristics of a body side part optical system positioned on the optical path between a mask and this scanning member. SOLUTION: A condensing lens 3 condenses the light flux from a mask 1 so as to guide the light to the following scanning member 4. The scanning member 4 made of a turning or oscillating mirror optically scans the mask surface. The optical element 3 on the optical path from the mask 1 to the scanning member 4 is assumed to be the body side part optical system 12 while the optical element 5-9 are in the image side part optical system 13. Respective elements are set up so that at least one distortion characteristics may become f.sinθcharacteristics. A scanning projection system 100 constitutes the body side part optical system 12, the scanning member 4 and the image side part optical system 13.
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