| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of uniformly exposing a work in a long range by overlapping small unit exposing areas. SOLUTION: The output light beam A0 from a laser light source 1 is divided into two light beams of A1 and A2 at the branching optical system 4 and led into collimating lens systems 5 and 6, respectively. The collimating lens systems 5 and 6 enlarge the diameter of the branched light beams A1 and A2, respectively, to collimate and generate collimated light beams A3 and A4 that cross at specified angles. At the intersection of these collimated light beams A3 and A4, an interference fringe having a Gaussian intensity distribution is generated on a work 9 placed on a stage 10 to expose a periodic pattern. The stage 10 is driven in a pitch of keeping the overlapped exposure energy distribution constant to perform the joined exposure on an area of the work 9 by controlling the scanning of the interference fringe. |
