发明名称 PROCESSING METHOD FOR PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a low-cost processing method for a photosensitive material free of environmental problem because the amount of waste liquor of a developing solution can be made absolutely zero. SOLUTION: In the processing method having at least a step for applying a developing solution to a photosensitive material having at least one photosensitive layer on the base and a step for removing at least the photosensitive layer with a release sheet, a surplus of the applied developing solution is absorbed in the release sheet.
申请公布号 JP2002202614(A) 申请公布日期 2002.07.19
申请号 JP20000400653 申请日期 2000.12.28
申请人 MITSUBISHI PAPER MILLS LTD 发明人 KUNIHIRO AKIRA;KURIO SADAO
分类号 G03C8/06;G03F7/00;G03F7/07;G03F7/30;(IPC1-7):G03F7/30 主分类号 G03C8/06
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