发明名称 |
PROCESSING METHOD FOR PHOTOSENSITIVE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a low-cost processing method for a photosensitive material free of environmental problem because the amount of waste liquor of a developing solution can be made absolutely zero. SOLUTION: In the processing method having at least a step for applying a developing solution to a photosensitive material having at least one photosensitive layer on the base and a step for removing at least the photosensitive layer with a release sheet, a surplus of the applied developing solution is absorbed in the release sheet. |
申请公布号 |
JP2002202614(A) |
申请公布日期 |
2002.07.19 |
申请号 |
JP20000400653 |
申请日期 |
2000.12.28 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
KUNIHIRO AKIRA;KURIO SADAO |
分类号 |
G03C8/06;G03F7/00;G03F7/07;G03F7/30;(IPC1-7):G03F7/30 |
主分类号 |
G03C8/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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