发明名称 Projection exposure system
摘要 A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width deltalambda about a central working wavelength lambda, wherein a relative width deltalambda/lambda of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.
申请公布号 US6806942(B2) 申请公布日期 2004.10.19
申请号 US20030434952 申请日期 2003.05.08
申请人 CARL ZEISS SMT AG 发明人 SCHUSTER KARL-HEINZ;ULRICH WILHELM;GRUNER TORALF;KRAEHMER DANIEL;SINGER WOLFGANG;EPPLE ALEXANDER;BEIERL HELMUT;GARREIS REINER
分类号 G02B13/14;G02B13/18;G02B13/22;G02B13/24;G03F7/20;H01L21/027;(IPC1-7):G03B27/54;G02B3/00;G02B9/00 主分类号 G02B13/14
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