METHOD FOR FORMING ETCHING MASK, METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURE, AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL PHOTONIC CRYSTALLINE LASER ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an etching mask capable of facilitating control of a pattern shape for forming an oblique hole in processing by oblique etching, to provide a method for manufacturing a three-dimensional structure, and to provide a method for manufacturing a three-dimensional photonic crystalline laser device. SOLUTION: In the method for forming an etching mask, a focused ion beam is irradiated to a surface of a substrate 200 and the etching mask 204 used for oblique etching which generates a portion including an ion in the irradiated region is formed. The method for manufacturing a three-dimensional structure includes: a step of preparing the substrate 200; a mask forming step of forming the etching mask 204 to the surface of the substrate 200 by using the method for forming the etching mask; and an etching step of dry-etching the substrate from a diagonal direction using the etching mask 204 and of forming a plurality of holes. COPYRIGHT: (C)2009,JPO&INPIT