Electron beam lithography methods including time division multiplex loading

摘要

An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a first clock signal and using the first clock signal to generate a second clock signal and a third clock signal. The second clock signal is sent to the first pixel and sending the third clock signal is sent to the second pixel.

主权项

1. A method of lithography, comprising:
generating a beam of electrons; providing a first pixel and a second pixel each configured to pattern the beam; using time domain multiplex loading to control the first and second pixels in patterning the beam, wherein the use of time domain multiplex loading includes:
receiving a first clock signal;using the first clock signal to generate a second clock signal and a third clock signal; andsending the second clock signal to the first pixel and sending the third clock signal to the second pixel.