IRRADIATION SYSTEM FOR A DEVICE FOR GENERATIVE PRODUCTION

摘要

An irradiation system (3) for a device (1) for laser-based generative production has a first beam source (13) of a first laser beam (13A) and a second beam source (15) of a second laser beam (15A), wherein the second laser beam (15A) has a beam quality that is higher than that of the first laser beam (13A). Furthermore, the irradiation system (3) has a common scanner optics (21) for focusing the first laser beam (13A) and the second laser beam (13B) within a production space (5) of the device (1) and a beam guiding system with a first beam path (13A') for guiding the first laser beam (13A) from the first beam source (13) to the scanner optics (21) and with a second beam path (15A') for guiding the second laser beam (15A) from the second beam source (15) to the scanner optics (21), wherein the beam guiding system has a beam combiner (19) for superimposing the beam paths of the first beam path (13A') and the second beam path (15A').