| 摘要 |
PURPOSE:To reduce the tact time of an apparatus and improve productivity by a method wherein alignment by using alignment marks is not performed for exposure after 2nd shot and an object to be exposed is transferred step by step so as to be placed at a predetermined position accurately by the other means such as a laser interferometer. CONSTITUTION:When 1st mask 1a is exposed, at first the mask 1a is aligned with mask reference marks 17 by a microscope 19. After that, the alignment marks of the mask 1a and the alignment marks of a substrate 3 formed in a previous process are measured by the microscope 19 to align the mask 1a and the substrate 3 and the 1st exposure is performed. When 2nd mask 1b is exposed, the mask 1b is aligned with the mask reference marks 17 by the microscope 19. After that, the substrate 3 is transferred accurately step by step so as to be placed at a predetermined position and be exposed while the position of the substrate 3 is being measured by a laser interferometer 14 and a scourer 15 provided on a stage. |
