| 摘要 |
PURPOSE:To predetermine the temperature of a development chamber arbitrarily and maintain the temperature at the predetermined value with a high accuracy by a method wherein the heat absorbing and generating parts of electronic cooling devices composed of N-type and P-type semiconductors joined with metal pieces are contacted with and attached to wall surfaces of a development vessel. CONSTITUTION:In the resist developing apparatus of the present invention, a supporting means for an object W to be developed is provided in a development vessel 1 and a spouting means 2 which spouts developer against the object W supported by the supporting means is provided and heat absorbing and generating parts 70 of electronic cooling devices 7 composed of N-type and P-type semiconductors joined with metal pieces are contacted with and attached to the wall surfaces of the development vessel 1. By controlling the direction and the magnitude of a current applied to the electronic cooling device 7, changeover between heat generation and heat absorption and control of heating value or heat absorbing value in the heat absorbing and generating part 70 of the electronic cooling device 7 can be performed. With this constitution, the temperature of a development chamber 10 can be maintained accurately at the constant value corresponding to the temperature conditions for the resist. |
