| 摘要 |
PURPOSE:To highly accurately inspect a pattern by using a charged particle beam after forming a conductive high polymer film on the surface or rear of a substrate to be inspected. CONSTITUTION:A conductive high polymer film 3 of polystyrene ammonium sulfoxide is rotationally applied to the whole surface of a photomask of chrome films 2 forming a pattern on a crystal glass substrate 1 to a thickness of 0.3mum, then, the photomask is heat-treated for 30 minutes at 100 deg.C. The photomask covered with the film 3 is inspected by scanning the photomask with an electron beam and detecting reflected electrons. Therefore, since electrostatic charging of incident electrons can be eliminated even when the pattern formed on the insulating plate is inspected and measured with the charged particle beam, highly accurate inspection can be carried out. |
