ON-SITE GENERATION OF ULTRA-HIGH-PURITY BUFFERED-HF FOR SEMICONDUCTOR PROCESSING
摘要
A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility. Anhydrous ammonia is purified by scrubbing (17) in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.
申请公布号
WO9639266(A1)
申请公布日期
1996.12.12
申请号
WO1996US10388
申请日期
1996.06.05
申请人
STARTEC VENTURES, INC.;HOFFMAN, JOE, G.;CLARK, R., SCOT