| 摘要 |
PURPOSE:To enable development which uses a noncombustible or flame-resistant liquid developer of 1,1,1-trichloroethane, etc., and to realize the composition which has superior resolution even in a thick film state by incorporating a specific photopolymerizing unsaturable compound, a photopolymerizing unsaturable compound, and a sensitizer. CONSTITUTION:The photopolymerizing unsaturable compound obtained from polyhydroxy ether shown by a formula I, orthocresol novolak type epoxy resin, the photopolymerizing unsaturable compound consisting principally of unsaturable carbonxylic acid, and a sensitizer and/or a sensitizer system which generates a free radical with active light are incorporated. In the formula I, R1 is shown by formulas II and III (where Y and Z are a hydrogen atom and a low-class alkyl radical or phenyl radical), X1, X2, X3, and X4 are hydrogen atoms, chlorine atoms, or bromine atoms, and (n) is a positive integer between 5 and 1,000. Consequently, the development can be carried out with the noncombustible or flame-resistant liquid developer of 1,1,1-trichrolethane, etc., and the photosensitive resin composition which has the superior resolution even in the thick film state is obtained. |
