| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. having high transparency to radiation and satisfactory dry etching resistance as a chemical amplification type resist. SOLUTION: The radiation sensitive resin compsn. contains a polymer contg. repeating units derived from a norbornene deriv. typified by 8-t- butoxycarbonyltetracyclo[4,4,0,1<1.5> ,1<7.10> ]norbornene, a radiation sensitive acid generating agent and an androstane-17-carboxylic-ester compd. typified by t- butoxycarbonylmethyl deoxycholate. In the formula, A and B are each H or an acid dissociable <=20C org. group which forms an acidic functional group when dissociated in the presence of an acid, at least one of A and B is the org. group, X and Y are each H or 1-4C alkyl and (n) is an integer of 0-3. |
