| 摘要 |
The invention concerns a buried light diffracting element (figure 1) comprising a network of empty channels (31) located inside a layer of material with high refractive index (210) incorporated in a substrate (11, 21); where the radiating efficacy of the network for guided beams can be enhanced without making the device too bulky, and be made more selective in propagation mode. Said device comprises two wafers (10, 20) assembled by wafer direct bonding (referred to below as WDB according to the English acronym), the two wafers comprising a substrate with low refractive index (11, 21), a layer with high refractive index above (210), one of the layers or both comprising an array etched on its surface, the bonded high refractive index layers forming planar optical waveguides with a network of buried empty channels (31). |
