| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for exposure in which exposure accuracy is enhanced while suppressing deformation of a substrate at the time of sucking the substrate, and the reliability of a device can be enhanced. SOLUTION: In the exposing method where a substrate P is sucked to a substrate stage 23 and the pattern of a mask R is transferred to the exposing region of the substrate P, the region to be sucked is specified for the substrate P depending on the exposing region and the specified region is sucked to the substrate stage 23.
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