发明名称 |
Photosensitive compositions and pattern formation method |
摘要 |
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
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申请公布号 |
US6342330(B2) |
申请公布日期 |
2002.01.29 |
申请号 |
US20010750672 |
申请日期 |
2001.01.02 |
申请人 |
TOYO GOSEI KOGYO CO., LTD.;SHOWA DENKO K.K. |
发明人 |
WATANABE MASAHARU;TOCHIZAWA NORIAKI;TAGOSHI HIROTAKA;YAMAGUCHI TETSUHIKO |
分类号 |
G03F7/012;(IPC1-7):G03F7/012;G03F7/30 |
主分类号 |
G03F7/012 |
代理机构 |
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