发明名称 Photosensitive compositions and pattern formation method
摘要 Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
申请公布号 US6342330(B2) 申请公布日期 2002.01.29
申请号 US20010750672 申请日期 2001.01.02
申请人 TOYO GOSEI KOGYO CO., LTD.;SHOWA DENKO K.K. 发明人 WATANABE MASAHARU;TOCHIZAWA NORIAKI;TAGOSHI HIROTAKA;YAMAGUCHI TETSUHIKO
分类号 G03F7/012;(IPC1-7):G03F7/012;G03F7/30 主分类号 G03F7/012
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